Suzhou Zhicai Technology has succeeded in developing a 6-inch high-purity, high-density magnesium-oxide sputtering target qualified for MRAM magnetic tunnel junction production. The target exhibits 4N purity, density above 99.8 percent, and grain uniformity at the international advanced level, edging ahead of mainstream Japanese competitors that typically report density just above 99.7 percent. The breakthrough closes the last foreign-controlled…
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