Samsung plans High-NA EUV for DRAM production by 2028

Samsung Targets 2028 for Industry-First High NA EUV DRAM Production - SAMSUNG ELECT LTD by Samsung Electr

Samsung expands AI chip manufacturing with ASML's High NA EUV tech and new 12-inch photomasks to boost productivity and drop costs.

Samsung Stock Closes at KRW 269,500 Before ASML Deal; the Real Test Starts in 2028

Samsung Electronics’ new ASML partnership gives investors a specific manufacturing target—High-NA EUV in volume DRAM production by 2028—but it does not yet change the 2026 earnings model. Samsung’s common shares closed Tuesday at KRW 269,500, down 0.19%, after touching KRW 279,000 intraday. The timing matters. Seoul trading ended at 3:30 p.m. local time, before the…

Samsung plans High-NA EUV for DRAM production by 2028

Samsung and ASML partner to bring High-NA EUV lithography to DRAM manufacturing by 2028, marking the first deployment of the technology in the

Samsung, SK hynix Target High-NA EUV DRAM Mass-Production

ASML high-NA EUV lithography machines. (Photo courtesy of ASML) Samsung Electronics and SK hynix, leading the global memory semiconductor market, are accelerating the introduction of High-NA EUV (High Numerical Aperture Extreme Ultraviolet), dubbed the ‘dream lithography equipment,’ to seize leadership in next-generation ultra-micro processes. Both companies have formalized 2028 as the starting point for mass-producing advanced DRAM based on Hig…