China Has Succeeded: Experimental Manufacturing of 3nm Transistors with DUV Lithography without EUV Systems
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China is making a huge leap in the semiconductor sector, as Chinese researchers have presented a new method for manufacturing GAA Transistors at levels below 3nm, using DUV (Deep Ultraviolet) lithography instead of EUV. This development is attracting huge interest, as China remains excluded from ASML’s advanced EUV equipment due to […]
The Chinese Academy of Sciences announced the experimental development of 3nm GAA transistors using DUV lithography, bypassing EUV equipment limitations.
The IMECAS center integrates GAA transistors with UVP lithography and opens a path to 3 nm chips without depending on the ASML SUV vetoed by the US and the Netherlands. The entry China challenges the US with 3nm chips without ASML SUV lithography aparece primero en Merca2.
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