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Belgium's imec secures rare ASML High NA EUV tool to drive next-generation chips
The $400 million lithography tool enables sub-2 nm logic and memory research, supported by €1.4 billion in public funds under the EU Chips Act.
- On Wednesday, Belgian chip research lab Imec secured an ASML $400-million High NA EUV lithography machine at its Leuven headquarters, one of fewer than a dozen such tools available worldwide.
- The tool anchors Imec's 2.5-billion-euro NanoIC pilot line, which is supported by 1.4 billion euros in public funding, including contributions from the EU Chips Act.
- High NA technology enables creation of chip features up to 66 per cent smaller, accelerating partner development of sub-2nm chip technologies for advanced computing and AI applications.
- Imec CEO Luc Van den hove said the installation "reinforces Europe's position at the heart of the global semiconductor value chain," marking a critical step into the angstrom era.
- The system will be fully qualified by Q4 2026, while the joint ASML-Imec High NA EUV Lithography Lab in Veldhoven, The Netherlands, ensures research continuity during the interim period.
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Imec receives the world’s most advanced High NA EUV system
LEUVEN (Belgium), MARCH 18, 2026— Today, imec, a world-leading research and innovation hub in advanced semiconductor technologies, announces the arrival of the ASML EXE:5200 High NA EUV lithography system, the most advanced lithography tool available today. With this strategic milestone, imec reinforces its position as the industry’s launchpad into the ångström era, giving its global partners ecosystem unparalleled early access to the next gener…
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